Surface sealing showerhead for vapor deposition reactor having integrated flow diverters
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United States of America Patent
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Mar 18, 2003
Grant Date -
May 23, 2002
app pub date -
Nov 20, 2001
filing date -
Nov 20, 2000
priority date (Note) -
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Abstract
The present invention relates to an improved structure of the 'showerhead used to introduce gaseous source material into a vapor deposition reactor such as a metal-organic chemical vapor deposition (MOCVD) reactor. The showerhead includes inlet seal assemblies that connect the inlet lines to the showerhead through the use of opposing planar seal faces so as to simplify the process of connecting and disconnecting the inlet lines to the showerhead. In addition, the showerhead includes a gas dispersion assembly on the inner face of the showerhead that optimizes the flow of gaseous material into the reaction chamber. The gas dispersion assembly includes a plurality of webbed disks that define discrete dispersion chambers. The webbed disks include integrally-formed flow diverters that direct the flow of gas into the dispersion chambers so as to create a controlled, uniform flow of material into the reaction chamber.
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