Acoustic/ultrasonic agitation to reduce microbubbles in developer
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United States of America Patent
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Mar 18, 2003
Grant Date -
N/A
app pub date -
Mar 8, 2000
filing date -
Mar 8, 2000
priority date (Note) -
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Abstract
The present invention relates to a method of eliminating microbubbles associated with a developer solution. The method includes depositing the developer solution over an exposed photoresist film which overlies a substrate and agitating the developer solution using waves. The agitation of the developer solution causes the microbubbles to exit the developer solution and reduces defects previously associated therewith. In addition, a system for eliminating microbubbles associated with a developer solution is disclosed. The system includes an apparatus for applying the developer solution to a photoresist film which overlies a substrate and a developer agitation system. The developer agitation system is operably coupled to the developer solution and agitates the developer solution using waves, which causes the microbubbles to exit the developer solution.
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