Method for improving the rate of a plasma enhanced vacuum treatment
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 18, 2003
Grant Date -
Jun 14, 2001
app pub date -
Aug 24, 1999
filing date -
May 3, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
For increasing the rate with which a workpiece is treated in a plasma enhanced chemical vapor deposition method and thereby lowering for coating treatment exposure of the coating to ion impact, there is maintained a non-vanishing dust particle density along the surface to be treated with a predetermined density distribution along this surface. The density distribution may be controlled by appropriately applying a field of force substantially in parallelism to the surface to be treated and acting on the dust particles entrapped in the plasma discharge.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully