Selective T-gate process
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Feb 25, 2003
Grant Date -
N/A
app pub date -
Aug 23, 2000
filing date -
Aug 23, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process of simultaneously forming a plurality of metal features on a substrate, in which at least one metal feature has undercut sides and at least one metal feature does not have undercut sides involves the application of a lower photoresist feature having rounded sides and an upper photoresist feature having undercut sides wherein the upper photoresist feature is positioned in offset relation to the lower photoresist feature such that one edge of the upper photoresist feature does not extend over the corresponding edge of the lower photoresist feature and the other edge of the upper photoresist feature does extend beyond the corresponding edge of the lower photoresist feature.
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