Method for forming dresser of chemical mechanical polishing pad
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United States of America Patent
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Feb 25, 2003
Grant Date -
N/A
app pub date -
Sep 28, 2001
filing date -
Nov 16, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for forming dresser of chemical mechanical polishing pad, firstly to make a stainless steel bottom seat. Then preparing metal welding powder and organic glue, mixing the aforesaid metal welding powder, organic glue and adequate ratio of water to welding thick liquid and uniformly distributing or pasting it on the aforesaid dresser bottom seat to form the sintering layer. The aforesaid metal welding material includes the active metal with diamond can form metal carbonate. Then using the computer visual inspection system to proceed the diamond powder distribution, uniformly distributing them for 60 to 2500 grains per square centimeter. Proceeding the sintering process to make the friction layer of chemical mechanical polishing pad dresser.
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