Apparatus for automatically cleaning mask
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United States of America Patent
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-
Feb 25, 2003
Grant Date -
N/A
app pub date -
Nov 10, 2000
filing date -
Nov 10, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for automatically cleaning a mask applied to a mask cleaning step after an evaporation process. An RF plasma is used to clean the mask. By isolating the RF plasma generator, the wafer table and the mask table from the grounded reaction chamber, the RF voltage is supplied to the wafer table and the mask table. The bias generated by the RF voltage during evaporation process can thus be reduced to enhance the efficiency of evaporation. After removing the wafer being performed with the evaporation process, the RF plasma can be used to clean the mask. The mask can thus be fixed on the mask table without being removed or renewing the mask table.
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