Method for cleaning semiconductor substrates
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United States of America Patent
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Dec 3, 2002
Grant Date -
N/A
app pub date -
Nov 6, 2000
filing date -
Nov 6, 2000
priority date (Note) -
Expired
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Abstract
A method and apparatus for cleaning organic material from a semiconductor substrate suppresses the oxidation of a conductive film or layer on the substrate. A semiconductor substrate is immersed within a bath of water. The conductive layer is contacted to a source of electrons. The electrons form a floating charge protecting the conductive layer from oxidation. Ozone gas is introduced into the water bath. In another aspect, the semiconductor substrate is sprayed with water. Organic contaminants or films are oxidized and removed by the ozone, while the conductive or metal layer is preserved. An anode may be placed adjacent to the surface of the semiconductor substrate to passivate the metal layer via current flow.
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