Lithography system with variable area substrate tiling
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Nov 19, 2002
Grant Date -
N/A
app pub date -
Jan 29, 2000
filing date -
Jan 29, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A dockable substrate chuck and demountable substrate frame, which can be placed atop the dockable substrate chuck, effectively extend the moving platform of an X-Y stage to access a larger substrate area. The system features a substrate chuck docking fixture. The dockable substrate chuck selectively grips or glides on a grip/glide plate on the stage. A bridge suspends the optics and Z-movable kinematic elements of a substrate chuck docking fixture. The docked dockable substrate chuck is fixed in space, in glide mode on a temporary air bearing. When the stage carriage reaches a new position with respect to the dockable substrate chuck, the substrate chuck docking fixture is turned off, and the puck of the dockable substrate chuck regains its grip on the grip/glide plate. The dockable substrate chuck is newly positioned on the stage, the demountable substrate frame is located with respect to the dockable substrate chuck, and the dockable substrate chuck vacuum grips the substrate for a high resolution scan.
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