Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography
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United States of America Patent
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Nov 19, 2002
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app pub date -
Feb 18, 2000
filing date -
Feb 18, 2000
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Abstract
A photoresist composition which includes hydroxycarborane either incorporated as a monomeric dissolution modifier or as pendent groups on a polymer backbone. The photoresist composition is particularly useful in a bilayer thin film imaging lithographic process in which ultraviolet radiation-imaging in a wavelength range of between about 365 nm and about 13 nm is employed.
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