Cup shaped plating apparatus with a disc shaped stirring device having an opening in the center thereof

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United States of America Patent

PATENT NO 6482300
APP PUB NO 20020108850A1
SERIAL NO

09779526

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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This invention provides a technique capable of solving a problem of an ununiform plating on an annular edge portion of a surface to be plated of a wafer, which ununiform plating is usually caused due to an ununiform flow of a plating apparatus, thereby ensuring a uniform plating treatment on the entire surface to be plated of a wafer. The present invention is directed to a cup-shaped plating apparatus comprising a wafer support section provided along an upper opening of a plating tank, a plurality of solution-outlet passages provided below the wafer support section and extending from the inside of and to the outside of the plating tank and at least one solution-supply pipe provided through the bottom of the plating tank.

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Patent Owner(s)

Patent OwnerAddress
ELECTROPLATING ENGINERRS OF JAPAN LIMITED (JAPANESE CORPORATION)6-6 NIHONBASHIKAYABA-CHO 2-CHOME CHUO-KU TOKYO 103-0025

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sakaki, Yasuhiko Hiratsuka, JP 7 78

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