Abrasive composition for polishing magnetic recording disk substrates
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United States of America Patent
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Nov 12, 2002
Grant Date -
Jan 10, 2002
app pub date -
Jan 23, 2001
filing date -
Jan 24, 2000
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Abstract
The present invention provides an abrasive composition for polishing magnetic recording disk substrates that results in a low surface roughness of the magnetic recording disk, allows the attaining of high-density recording without the occurrence of protrusions or polishing scratches, and enables polishing to be performed at an economical speed. The present invention discloses an abrasive composition for polishing magnetic recording disk substrates comprising water, silicon dioxide, antigelling agent, aluminum nitrate and hydrogen peroxide.
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