Electron microscope

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United States of America Patent

PATENT NO 6472663
APP PUB NO 20020033451A1
SERIAL NO

09182356

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Abstract

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Relationship among an exciting current of each lens of an irradiation lens system including at least two stages of irradiation lenses and an electron beam aperture, an irradiation electron beam density on a sample and an area of the sample surface irradiated with an electron beam is stored in a form of a table or equations, and an exciting condition of each of the lenses of the irradiation lens system is retrieved from the relationship and set the irradiation lens system to the retrieved condition, for example, when the enlarging magnification is changed under a condition of keeping the irradiation electron beam density at a constant value. Further, trails of a region of the sample surface irradiated with the electron beam is displayed on a display unit.

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTD6-6 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 1008280 ?1008280
HITACHI INSTRUMENTS ENGINEERING CO LTD832-2 NAGAKUBO HORIGUCHI KATSUTA-SHI IBARAKI 312 JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kobayashi, Hiroyuki Mito, JP 792 9078
Nagaoki, Isao Hitachinaka, JP 31 174
Yotsuji, Takafumi Hitachinaka, JP 9 55

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