Method for producing a structure of interference colored filters
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United States of America Patent
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Oct 22, 2002
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app pub date -
Aug 18, 2000
filing date -
Feb 20, 1998
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Abstract
A process for the production of a color filter layer system structure on a substrate uses a structure lacquer layer which is deposited in a lift-off technique on the substrate. Lacquer layer surface regions and regions free of lacquer layer are present. Subsequently through a vacuum coating process a color filter layer system is deposited and subsequently with the lacquer layer surface regions the regions of the color filter layer system deposited thereon are removed. The deposition of the color filter layer system takes place through a plasma-enhanced coating at a temperature of maximally 150.degree. C. The deposition takes place, for example, by sputtering or plasma-enhanced vapor deposition.
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