Capacitor structure and fabrication process

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United States of America Patent

PATENT NO 6460416
SERIAL NO

09112849

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Abstract

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The invention relates to a capacitor structure with two substrates (1) each having a capacitor electrode (3) deposited on its surface, the substrates (1) being joined together by bump structures located on both sides of the capacitor electrodes (3) such that the capacitor electrodes (3) lie opposite each other and form a capacitor, the distance d between the capacitor electrodes (3) being defined by the height of the bump structures, and measuring connections (5) being provided on one of the substrates (1) for making capacitance measurements.

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Patent Owner(s)

Patent OwnerAddress
MICRONAS INTERMETALL GMBH79108 FREIBURG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Igel, Gunter Teningen, DE 32 404

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