Unit for a plasma atomizer device with plasma gas-supply means, sample atomizer means and sample injection means
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United States of America Patent
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Sep 10, 2002
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N/A
app pub date -
Jul 13, 2000
filing date -
Jul 13, 1999
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Abstract
The present invention relates to a unit for a plasma atomizer device comprising a supply means for supplying a gas for generating a plasma, an atomizer means for atomizing a sample to be analyzed, an injection means for injecting the atomized sample into a plasma generated with the supplied gas, and a support means for holding the supply means, the atomizer means and the injection means. The invention is characterized in that the support means is connectable to a generator chamber wall of the atomizer device in such a manner that the supply means and the injection means are arranged inside the generator chamber.
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