Acid-decomposable ester compound suitable for use in resist material

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Sep 10, 2002
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Aug 22, 2002
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May 18, 2000
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May 19, 1999

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Abstract

A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester as the acid-decomposable site is used as a dissolution regulator to formulate a resist composition having a high sensitivity, resolution, etching resistance and storage stability.

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SHIN-ETSU CHEMICAL CO LTD	TOKYO TOKYO METROPOLIS

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Inventor Name	Address	# of filed Patents	Total Citations
Hasegawa, Koji	Niigata-ken, JP	299	3234
Hatakeyama, Jun	Niigata-ken, JP	692	7607
Kinsho, Takeshi	Niigata-ken, JP	285	2900
Nakashima, Mutsuo	Niigata-ken, JP	73	883
Nishi, Tsunehiro	Niigata-ken, JP	112	1211
Watanabe, Takeru	Niigata-ken, JP	213	2730

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Acid-decomposable ester compound suitable for use in resist material

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09572975

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PATENT NO	6448420
APP PUB NO	20020115874A1
SERIAL NO	09572975
DOCKET NO

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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
September 10, 2002	US,6448420,B1 US6448420B1	GRANTED PATENT AS FIRST PUBLICATION
August 22, 2002	US,20020115874,A1 US20020115874A1	FIRST PUBLISHED PATENT APPLICATION

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