Particle-optical apparatus and process for the particle-optical production of microstructures
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United States of America Patent
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Aug 20, 2002
Grant Date -
N/A
app pub date -
Dec 2, 1999
filing date -
Dec 2, 1998
priority date (Note) -
Expired
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Abstract
The invention relates to a particle-optical apparatus for particle-optical mask projection. According to the invention, an energy filter is used, by which particles which are inelastically scattered in a mask plane are separated from particles which are elastically scattered in the mask plane. Particles from a selected energy range are used for the particle-optical imaging of the mask in the final image plane. The energy filter is an imaging energy filter, the mask plane being coincident with the input image plane of the energy filter or being imaged in it. The output image plane of the energy filter is imaged, reduced in scale, by a following imaging system on a wafer arranged in the projection plane. Beam deflection systems are provided in addition, by which the particle beam is deflectable in the mask plane and onto out-of-axis regions, so that different regions of the mask plane can be imaged in the image plane at successive times.
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