Airborne gas phase sorption enhancement using ultraviolet light
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United States of America Patent
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Jul 23, 2002
Grant Date -
N/A
app pub date -
Sep 21, 2000
filing date -
Sep 21, 1999
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Expired
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Abstract
A method and apparatus are disclosed for gas phase sorption in which a sorption device having an inlet is provided in combination with a source of UV light. The UV light is directed at the inlet of the sorption device for the purpose of destroying organic gas phase compounds and the removal of residue, and OH radicals are formed by the UV light proximate the inlet of the sorption device to destroy organic gas phase compounds disposed on and proximate the inlet of the sorption device. The sorption device is reactivated in situ, the single pass efficiency of the sorption device is enhanced, and the mechanical useable service life of the sorption device is enhanced.
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