Synthetic quartz glass preform
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United States of America Patent
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Jul 23, 2002
Grant Date -
N/A
app pub date -
Sep 10, 1999
filing date -
Mar 7, 1997
priority date (Note) -
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Abstract
The invention relates to a synthetic quartz glass preform which is produced according to the flame hydrolysis technique with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. Said preform has a core area which contains .gtoreq.1150 ppm OH, a strain double refraction of .ltoreq.5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of .DELTA. T .ltoreq.0.1 %/cm thickness. The quartz glass has been exposed to the following radiation: wavelength .lambda..sub.1 =248 nm, laser shot frequency .gtoreq.300 Hz, laser shot value .gtoreq.10.sup.9 and rumination .ltoreq.10 mJ/cm.sup.2, and wavelength .lambda..sub.2 =193 nm, laser shot frequency .gtoreq.300 Hz, laser shot value .gtoreq.10.sup.9 and rumination .ltoreq.5 mJ/cm.sup.2. A device for producing said preform comprises a horizontally positioned muffle with two different-sized openings facing each other. The larger of said openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.
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