Semiconductor component and method of manufacture

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United States of America Patent

PATENT NO 6417050
SERIAL NO

09636646

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Abstract

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A method of manufacturing a semiconductor component includes disposing a layer (120) of an electrically insulative material over a semiconductor substrate (110), etching a trench (310) into the layer and the semiconductor substrate, disposing a layer (410) of a semiconductor material in the trench, and forming a gate contact (1410) in the trench.

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Patent Owner(s)

Patent OwnerAddress
XENOGENIC DEVELOPMENT LIMITED LIABILITY COMPANY2711 CENTERVILLE RD SUITE 400 WILMINGTON DE 19808

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Saito, Yoshinori Miyagi, JP 93 793

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