Cleaning method
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United States of America Patent
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Jul 9, 2002
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N/A
app pub date -
Nov 29, 1999
filing date -
Dec 1, 1998
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Abstract
The present invention has as an object thereof to provide a cleaning method which realizes, in the cleaning process, (1) a reduction in the number of processes, (2) a simplification of the cleaning apparatus, and (3) a reduction in the amount of chemicals and pure water employed, and which has highly superior cleaning effects and does not damage the substrate body, as well as to provide a rinsing method which aids in the hydrogen termination of silicon atoms.
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