Method for making optical microstructures having profile heights exceeding fifteen microns
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United States of America Patent
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Jun 25, 2002
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app pub date -
Jun 9, 1998
filing date -
Jun 9, 1998
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Abstract
Fabrication of arbitrary profile micro-optical structures (lenses, gratings, etc.) and, if desired, with optomechanical alignment marks simultaneously during fabrication is based upon the use of low-contrast photosensitive material that, when exposed to a spatially variable energy dosage of electromagnetic radiation, can be processed to achieve multi-level or continuous surface-relief microstructures. By varying the exposure dose spatially based upon predetermined contrast curves of the photosensitive material, arbitrary one-dimensional (1-D) or two-dimensional (2-D) surface contours, including spherical, aspherical, toroidal, hyperbolic, parabolic, and ellipsoidal, can be achieved with surface sags greater than 15 .mu.m. Surface profiles with advanced phase correction terms (e.g., Zernike polynomials) can be added to increase the alignment tolerance and overall system performance of the fabricated structure can also be fabricated. The continuous-relief pattern can be used as is in the photosensitive material, transferred into the underlying substrate through an etch process, electroformed into a metal, or replicated into a polymer.
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