Rotatable sputter target
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Jun 25, 2002
Grant Date -
N/A
app pub date -
Sep 20, 2000
filing date -
Sep 20, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A rotatable sputter target for use in a sputtering system having a sleeve of sputtering material attached to a structural support tube such that an annular space is formed between the inside surface of the sleeve and the outside surface of the support tube. The annular space is at least partly filled with a thermally and electrically conductive material which flows at ambient temperature. The annular space is sealed at either end so that the material cannot escape the annular space.
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