Developer for photosensitive polyimide resin composition
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United States of America Patent
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Jun 11, 2002
Grant Date -
N/A
app pub date -
Oct 30, 1998
filing date -
Oct 31, 1997
priority date (Note) -
Expired
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Abstract
The invention relates to a developer for photosensitive polyimide resin compositions, comprising an alkaline aqueous solution containing a basic compound (A) represented by a formula (1): ##STR1## wherein X.sup.+ is N.sup.+ or P.sup.+, R is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 10 ring forming carbon atoms, Y.sup.- is a monovalent anion, m is 0 or 1, n is 3 or 4, and m+n is 4, with the proviso that when m is 0, n is 4, and R is an alkyl group, the total number of carbon atoms of 4 alkyl groups is at least 13, or when m is 1, n is 3, and R is an alkyl group, the total number of carbon atoms of 3 alkyl groups is at least 6.
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