Water-processable photoresist compositions
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United States of America Patent
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Jun 4, 2002
Grant Date -
N/A
app pub date -
Aug 14, 2000
filing date -
Aug 13, 1999
priority date (Note) -
Expired
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Abstract
Water-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an aqueous base upon heat treatment, and an acid-labile functional group that restores said water or aqueous base solubility to the polymer upon irradiation in the presence of a water-processable photoacid generator, are described. Also described are the methods of making such polymers and photoresists.
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