Method of filling an embroidery stitch pattern with satin stitches having a constant interstitch spacing

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United States of America Patent

PATENT NO 6390005
SERIAL NO

09079011

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Abstract

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A method of filling a defined embroidery pattern shape, with the shape comprising a curve defining the shape, fills the pattern shape with a plurality of turning satin-like embroidery stitches which turn to follow the defined shape. In carrying out the method, the density inset for the next adjacent satin-like embroidery stitch is dynamically varied in accordance with any change in the defined shape from the previous stitch, taking into account the stitch length and stitch angle. The process is iteratively repeated , using the predefined perpendicular distance from the previous stitch end point to the new stitch end point until the defined shape is completely filled.

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Patent Owner(s)

Patent OwnerAddress
PULSE MICROSYSTEMS LTDMISSISSAUGA ONTARIO L5N 6M6

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chia, Benito 150 FB Cabahug St., Mandaue City, Cebu, PH 1 6
Goldberg, Brian 73 Coldwater Court, Thornhill, Ontario, CA 12 165
Mayya, Niranjan 7080 Walworth Court, Mississauga, Ontario, CA 12 218
Tsonis, Anastasios 185 Golf Court Rd, Conemoga, Ontario, CA 14 224

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