Compound for the aluminum film from chemical vapor deposition and the method of synthesis
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United States of America Patent
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Apr 30, 2002
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N/A
app pub date -
Jun 16, 2000
filing date -
Sep 15, 1998
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Expired
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Abstract
Organometallic precursor compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic precursor compounds and methods of forming aluminum films.
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