Zirconium alkoxytris (.beta.-Diketonate), process for manufacturing the same, and liquid composition for formation of PZT film
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United States of America Patent
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Apr 23, 2002
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app pub date -
Oct 5, 2000
filing date -
Nov 19, 1999
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Abstract
There is provided a compound for the formation of a PZT film using Pb(dpm).sub.2 where the compound has a low reactivity with Pb(dpm).sub.2, has a thermal decomposition temperature which is lower than Zr(dpm).sub.4 and is well soluble in a solvent such as butyl acetate and toluene. There is also provided a process for the manufacture of the compound. There is further provided a liquid composition for the formation of a PZT film using the compound. The novel compound Zr(OiPr)(dpm).sub.3 has a sublimation pressure of 0.1 Torr/160.degree. C. and is able to form a ZrO.sub.2 film by a CVD at 400.degree. C. That can be prepared by the reaction of 1 mol of Zr(OiPr).sub.4 and 3 mol of dpmH in an organic solvent followed by purifying by sublimation. A solution of Pb(dpm).sub.2, Zr(OiPr)(dpm).sub.3 and Ti(OiPr).sub.2 (dpm).sub.2 dissolved in butyl acetate has a long pot life and forms a PZT film by a solution flash CVD method.
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