Data hierarchy layout correction and verification method and apparatus
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United States of America Patent
Stats
-
Apr 9, 2002
Grant Date -
N/A
app pub date -
Sep 16, 1998
filing date -
Sep 17, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and apparatus for the correction of integrated circuit layouts for optical proximity effects which maintains the original true hierarchy of the original layout is provided. Also provided is a method and apparatus for the design rule checking of layouts which have been corrected for optical proximity effects. The OPC correction method comprises providing a hierarchically described integrated circuit layout as a first input, and a particular set of OPC correction criteria as a second input. The integrated circuit layout is then analyzed to identify features of the layout which meet the provided OPC correction criteria. After the areas on the mask which need correction have been identified, optical proximity correction data is generated in response to the particular set of correction criteria. Finally, a first program data is generated which stores the generated optical proximity correction data in a hierarchical structure that corresponds to the hierarchical structure of the integrated circuit layout. As the output correction data is maintained in true hierarchical format, layouts which are OPC corrected according to this method are able to be processed through conventional design rule checkers with no altering of the data.
First Claim
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