Relating to monitoring ion sources
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United States of America Patent
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-
Apr 2, 2002
Grant Date -
N/A
app pub date -
May 7, 1999
filing date -
May 8, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The apparatus and method provide techniques for monitoring the position on alpha contamination in or on items or locations. The technique is particularly applicable to pipes, conduits and other locations to which access is difficult. The technique uses indirect monitoring of alpha emissions by detecting ions generated by the alpha emissions. The medium containing the ions is moved in a controlled manner frog in proximity with the item or location to the detecting unit and the signals achieved over time are used to generate alpha source position information.
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