Bright field image reversal for contact hole patterning
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United States of America Patent
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Mar 19, 2002
Grant Date -
N/A
app pub date -
Nov 21, 2000
filing date -
Nov 21, 2000
priority date (Note) -
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Abstract
A method of forming a small contact hole uses a bright field mask to form a small cylinder in a positive resist layer. A negative resist layer is formed around the small cylinder, and then etched or polished back to leave a top portion of the small cylinder exposed above the negative resist layer. The negative resist layer and the small cylinder (positive resist) are flood exposed to light, and then subject to a developer. What remains is a small contact hole located where the small cylinder was previously located.
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