Holder assembly system and method in an emitted energy system for photolithography
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United States of America Patent
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-
Mar 5, 2002
Grant Date -
Nov 22, 2001
app pub date -
Jan 29, 2001
filing date -
Apr 3, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).
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