Photosensitive compositions and pattern formation method
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United States of America Patent
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Jan 29, 2002
Issued Date -
N/A
app pub date -
Jan 2, 2001
filing date -
Sep 24, 1998
priority date (Note) -
Expired
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Abstract
Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
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