Target and process for its production, and method for forming a film having a high refractive index
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 1, 2002
Grant Date -
Sep 13, 2001
app pub date -
Dec 5, 2000
filing date -
Aug 23, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO.sub.x as the main component, wherein MO.sub.x is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully