Ester compounds, polymers, resist compositions and patterning process
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United States of America Patent
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Nov 6, 2001
Grant Date -
N/A
app pub date -
Nov 1, 1999
filing date -
Nov 2, 1998
priority date (Note) -
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Abstract
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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