Method for producing a semiconductor material
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United States of America Patent
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Oct 30, 2001
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N/A
app pub date -
Sep 15, 1998
filing date -
Sep 19, 1997
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Abstract
Semiconductor material has a low metal concentration at the surface. The semiconductor material has an iron content and/or chromium content on the surface of less than 6.66.times.10.sup.-11 g/cm.sup.2. A method for producing this semiconductor material includes a preliminary cleaning, a main cleaning and hydrophilization. A device for use in this method has a container with pyramid-shaped recesses at the bottom.
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