Method for making a thin film of solid material
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 16, 2001
Grant Date -
N/A
app pub date -
Feb 14, 2000
filing date -
Aug 12, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention relates to a method of manufacturing a thin film of solid material comprising at least the following steps: a step of ionic implantation through one face of a substrate of said solid materials using ions capable of creating in the volume of the substrate and at a depth close to the mean depth of penetration of the ions, a layer of micro-cavities or micro-bubbles, this step being carried out at a particular temperature and for a particular length of time, an annealing step intended to bring the layer of micro-cavities or micro-bubbles to a particular temperature and for a particular length of time with the intention of obtaining cleavage of the substrate on both sides of the layer of micro-cavities or micro-bubbles. The annealing step is carried out to a thermal budget made in relation to the thermal budget of the ionic implantation step and possibly other thermal budgets inferred for other steps, in order to provide said cleavage of the substrate.
First Claim
Other Claims data not available