Reticle having assist feature between semi-dense lines

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United States of America Patent

PATENT NO 6303252
SERIAL NO

09470635

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Abstract

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A reticle having an assist feature between semi-dense lines is described. The reticle has two adjacent, substantially parallel, and substantially equally spaced line segments of which each representing a portion of a main feature having a line width, between two adjacent line segments of the group having a gap space, wherein the gap-space/line-width ratio is equal to about 3-6.5. Between the two adjacent line segments, at least one inside assist feature is located. At the outside edges of the extreme left-hand and right-hand line segments, two outside assist features are located, respectively, wherein each of the two assist features has a first width and is spaced apart from the nearest line segment by a distance.

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Patent Owner(s)

Patent OwnerAddress
UNITED MICROELECTRONICS CORPNO 3 LI-HSIN ROAD 2 SCIENCE-BASED INDUSTRIAL PARK HSIN-CHU CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lin, Chin-Lung Kaohsiung, TW 80 536

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