Support base for light-sensitive photographic elements
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United States of America Patent
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Oct 9, 2001
Grant Date -
N/A
app pub date -
May 23, 2000
filing date -
May 25, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates to a support base for light-sensitive photographic elements. In particular, the present invention relates to a support base comprising a support having coated thereon at least two antihalation layers overcoated by a protective layer. The support base for light-sensitive photographic elements of the present invention presents an improved coating quality with a reduced formation of mottle, defined as an irregularly patterned defect due to the tendency of the coated layers to reproduce any deformation present on the support.
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