Illumination system and REMA objective with lens displacement and operating process therefor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Sep 25, 2001
Grant Date -
N/A
app pub date -
Mar 5, 1999
filing date -
Mar 5, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An illumination system for a microlithography projection illumination equipment, in which a secondary light source is imaged on a reticle . The distortion of the image can be set by at least one variable optical path between optical elements, and the uniformity of the illumination is changed because of the changed distortion, in particular, in that the uniformity is increased toward the edge.
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