Condenser for extreme-UV lithography with discharge source
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United States of America Patent
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Sep 4, 2001
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N/A
app pub date -
Jan 21, 2000
filing date -
Jan 21, 2000
priority date (Note) -
Expired
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Abstract
Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.
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