Lactone-containing compounds, polymers, resist compositions, and patterning method
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United States of America Patent
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Aug 28, 2001
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N/A
app pub date -
Sep 24, 1999
filing date -
Sep 25, 1998
priority date (Note) -
Reissued
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Abstract
A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance. ##STR1##
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