Metal polishing composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 14, 2001
Grant Date -
N/A
app pub date -
Jan 15, 1999
filing date -
Nov 6, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Polishing slurries for use in polishing substrates having a nickel or nickel-containing surface, such as those used for magnetic media, are described. The slurries include, in addition to a chemical etchant such as aluminum nitrate and suspended abrasive particles, an oxidizer which converts nickel metal at the surface to nickel oxide, but does not solubilize the nickel oxide in the aqueous medium to any significant degree. Preferred oxidizers include hydrogen peroxide, ferric nitrate and potassium iodate.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully