Subresolution grating for attenuated phase shifting mask fabrication
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United States of America Patent
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Jul 31, 2001
Issued Date -
N/A
app pub date -
Mar 28, 2000
filing date -
Jan 8, 1998
priority date (Note) -
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Abstract
A subresolution grating composed of approximately circular contacts is fabricated around the border of the primary pattern of a photomask. As a result, resolution at the edges of the photomask pattern is improved when the pattern is printed on a wafer surface. In addition, the reduced leakage enables a more efficient use of the glass plate on which the photomask is fabricated as well as a more efficient use of the wafer surface as a result of being able to place patterns closer together.
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