Plasma processing device for surfaces
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United States of America Patent
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Jul 24, 2001
Grant Date -
N/A
app pub date -
Apr 20, 2000
filing date -
Apr 3, 1998
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Abstract
A mechanism for plasma surface treatment includes a rotating head having at least one eccentrically disposed plasma nozzle for generating a plasma jet directed in parallel with the axis of rotation. The nozzle includes a swirl system for swirling the plasma jet.
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