Apparatus and method for the enhanced imagewise exposure of a photosensitive material
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United States of America Patent
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Jul 17, 2001
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app pub date -
Aug 24, 1999
filing date -
Aug 24, 1999
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Abstract
In accordance with the present invention, there are provided apparatus and methods useful for efficiently subjecting photosensitive materials to a relatively low energy pre-exposure using the electromagnetic energy during the non-imaging portion of the exposure process (i.e., a backscan beam exposure) prior to subjecting such materials to the main imaging exposure (i.e., an imagewise exposure). In a further aspect of the present invention, there are provided combinations and improvements useful for the enhanced imagewise exposure of photosensitive materials. In additional aspects of the present invention, there are provided methods of enhancing the imagewise exposure of photosensitive materials, imagewise exposed photosensitive material made according to such methods, methods for enhancing sensitivity of a photosensitive material for imagewise exposure, and photosensitive materials having enhanced sensitivity for imagewise exposure made according to these methods.
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