Oxime derivatives and the use thereof as latent acids
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United States of America Patent
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-
Jul 17, 2001
Grant Date -
N/A
app pub date -
Mar 23, 2000
filing date -
Mar 31, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Compounds of formula I, II and III, wherein ##STR1## wherein R.sub.1 is for example hydrogen, C.sub.1 -C.sub.12 alkyl, C.sub.3 -C.sub.30 cycloalkyl, C.sub.2 -C.sub.12 alkenyl, C.sub.4 -C.sub.8 cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R.sub.1 with the exception of hydrogen can additionally be substituted by a group having a --O--C-bond or a --O--Si-bond which cleaves upon the action of an acid; R'.sub.1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R.sub.2 is halogen or C.sub.1 -C.sub.10 haloalkyl; R.sub.3 is for example C.sub.1 -C.sub.18 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R.sub.3 is e.g. C.sub.2 -C.sub.6 haloalkanoyl, or halobenzoyl, R'.sub.3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.
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