Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
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United States of America Patent
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Jul 17, 2001
Grant Date -
N/A
app pub date -
Jul 14, 1999
filing date -
Mar 18, 1999
priority date (Note) -
Expired
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Abstract
A method and apparatus for improved metal oxide chemical vapor deposition on a substrate surface where the application boundary layer is reduced and where the uniformity of the application boundary layer is greatly enhanced in a reactor. Primary and secondary sonic or other disturbance sources are introduced to the interior chamber or an oscillating chuck is incorporated to influence the boundary layer thickness and uniformity.
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