Importance

Loading Importance Indicators...

Abstract

An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent: A) between about 0.05 and about 1.0 wt % of a first surfactant or surfactant mixture, the first surfactant(s) having the general formula: R--O--(AO).sub.n --H where AO are alkylene oxide units selected from ethylene oxide units (CH.sub.2 --CH.sub.2 --O) and propylene oxide units (CH(CH.sub.3)--CH.sub.2 --O) or (CH.sub.2 --CH(CH.sub.3)--O) and mixtures of ethylene and propylene oxide units, either in the mixture of molecules, where R is a hydrophobic group, n is between about 8 and about 200, and B) as a second surfactant, between about 0.05 and 1.0 wt % of an organic salt having the formula: ##STR1## where R is an alkyl or aryl group, preferably phenyl, A is selected from carboxyl, sulfonyl, phosphonyl and mixtures thereof, preferably sulfonyl. M is a charge-balancing cation, and n is between 1 and about 200, preferably between 2 and about 100. the weight ratio of A) to B) being between about 1:5 and about 5:1.

Loading the Abstract Image...

First Claim