Coating for parts used in semiconductor processing chambers
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United States of America Patent
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May 22, 2001
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N/A
app pub date -
Jun 26, 1998
filing date -
Jun 26, 1998
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Abstract
Improved semiconductor processing chamber parts are provided. An improved part is made of an underlying part having both an intermediate coating and a surface layer applied thereto. The intermediate coating includes a plurality of layers each having a CTE intermediate the CTE of the underlying part and the CTE of the surface layer. The intermediate coating reduces the stress between any two layers, allowing use of underlying parts and surface layers having dissimilar CTEs. The universe of acceptable materials for use within a semiconductor processing chamber is expanded, as fewer selection criteria exist for a given layer.
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